Integrated circuit device

ABSTRACT

An integrated circuit device includes channel structures extending from a substrate in a vertical direction, memory cell strings disposed along the plurality of channel structures, gate lines spaced apart from one another in the vertical direction and including erase control lines and string selection lines, and driving transistors including erase control driving transistors connected to the erase control lines and string selection driving transistors connected to the string selection lines.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the benefit of Korean Patent Application No.10-2019-0023287, filed on Feb. 27, 2019 in the Korean IntellectualProperty Office, the disclosure of which is incorporated herein in itsentirety by reference.

BACKGROUND

The inventive concept relates generally to integrated circuit devices.More particularly, the inventive concept relates to integrated circuitdevices including a vertical memory device.

Contemporary integrated circuit devices demand ever greater data storagecapacity while maintaining relatively small physical sizes. Thiscompound set od demands requires ever greater integration density.Vertical memory devices provide memory cells stacked on a substrate in avertical direction. In order to increase the data storage capacity ofvertical memory devices, the number of stacked memory cells must beincreased while maintaining efficient read, writes and/or eraseoperations.

SUMMARY

Embodiments of the inventive concept provides integrated circuit devicesin which the number of stacked memory cells may be increased, yetcontrolled.

According to an aspect of the inventive concept, there is provided anintegrated circuit device including; a plurality of channel structuresextending in a vertical direction from a main surface of a substrate, aplurality of memory cell strings disposed in the vertical directionalong the plurality of channel structures, wherein each memory cellstring includes a plurality of serially-connected memory cells, aplurality of gate lines spaced apart from one another in the verticaldirection and including erase control lines and string selection lines;and a plurality of driving transistors including erase control drivingtransistors connected to the erase control lines and string selectiondriving transistors connected to the string selection lines, wherein atleast two gate lines spaced apart from one another in a horizontaldirection with respect to the main surface of the substrate among theplurality of gate lines are commonly connected to one of the pluralityof driving transistors.

According to another aspect of the inventive concept, there is providedan integrated circuit device including; channel structures extending ina vertical direction from a substrate, bit lines respectively connectedto the channel structures and extending in a first horizontal direction,gate electrodes vertically stacked on the substrate, intersecting thechannel structures, having a stepped pattern, and extending in a secondhorizontal direction over the substrate, and an erase control drivingtransistor and at least two string selection driving transistors. Atleast two of the gate electrodes respectively function as erase controllines, at least another two of the gate electrodes respectively functionas string selection lines, the erase control lines and the stringselection lines are spaced apart from one another in the firsthorizontal direction, the erase control lines are commonly connected tothe erase control driving transistor, and each of the string selectionlines is respectively connected to one of the at least two stringselection driving transistors.

According to another aspect of the inventive concept, there is providedan integrated circuit device including; channel structures extending ina vertical direction from a substrate, memory cell strings disposed inthe vertical direction along the channel structures, wherein each one ofthe memory cell strings includes serially-connected memory cells, gateelectrodes spaced apart from one another in the vertical direction,intersecting the channel structures, and extending in a secondhorizontal direction over the substrate, and driving transistorsincluding erase control driving transistors and string selection drivingtransistors,

wherein the gate electrodes include word lines, erase control lines, andstring selection lines, the at least two of the erase control lines arespaced apart from one another in a first horizontal direction and arecommonly connected to one erase control driving transistor, and the atleast two string selection lines are spaced apart from one another inthe first horizontal direction and are respectively connected to the atleast two string selection driving transistors.

According to another aspect of the inventive concept, there is providedan integrated circuit device including; a plurality of channelstructures extending from a substrate in a vertical direction withrespect to a main surface of the substrate, at least two memory cellstrings having a plurality of memory cells, string selectiontransistors, and erase control transistors serially connected along atleast two of the plurality of channel structures, and at least two erasecontrol lines connected to the erase control transistor of each of theat least two memory cell strings and spaced apart from one another in ahorizontal direction, wherein the erase control transistor of each ofthe at least two memory cell strings performs an erase operation by oneerase control driving transistor commonly connected to the at least twoerase control lines.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the inventive concept may be more clearly understood fromthe following detailed description taken in conjunction with theaccompanying drawings in which:

FIG. 1 is a plan view illustrating main components of an integratedcircuit device according to an embodiment of the inventive concept;

FIG. 2A is an equivalent circuit diagram of a memory cell array of anintegrated circuit device according to an embodiment of the inventiveconcept;

FIGS. 2B and 2C are cross-sectional views of an integrated circuitdevice according to embodiments of the inventive concept;

FIG. 3A is an equivalent circuit diagram of a memory cell array of anintegrated circuit device according to an embodiment of the inventiveconcept;

FIG. 3B is a cross-sectional view of an integrated circuit deviceaccording to an embodiment of the inventive concept;

FIG. 4A is an equivalent circuit diagram of a memory cell array of anintegrated circuit device according to an embodiment of the inventiveconcept;

FIGS. 4B and 4C are cross-sectional views of integrated circuit devicesaccording to embodiments of the inventive concept;

FIGS. 5, 6 and 7 are respective equivalent circuit diagrams of memorycell arrays of integrated circuit devices according to embodiments ofthe inventive concept;

FIG. 8 is a cross-sectional view of an integrated circuit deviceaccording to an embodiment of the inventive concept;

FIGS. 9A, 9B, 9C, 9D and 9E are respective cross-sectional views of thedashed line region IX of the integrated circuit device shown in FIG. 8;

FIG. 10A is an equivalent circuit diagram of a memory cell array of anintegrated circuit device according to an embodiment of the inventiveconcept;

FIG. 10B is a plan view illustrating main components of an integratedcircuit device according to an embodiment of the inventive concept;

FIG. 10C is a cross-sectional view of an integrated circuit deviceaccording to an embodiment of the inventive concept;

FIG. 11 is an equivalent circuit diagram of a memory cell array of anintegrated circuit device according to an embodiment of the inventiveconcept;

FIGS. 12 and 13 are respective cross-sectional views of integratedcircuit devices according to embodiments of the inventive concept;

FIGS. 14 and 15 are respective equivalent circuit diagrams of memorycell arrays of integrated circuit devices according to embodiments ofthe inventive concept;

FIGS. 16, 17 and 18 are respective cross-sectional views of integratedcircuit devices according to embodiments of the inventive concept; and

FIG. 19 is a cross-sectional view of an integrated circuit deviceaccording to an embodiment of the inventive concept.

DETAILED DESCRIPTION

Figure (FIG. 1 is a plan view illustrating an integrated circuit device1 according to embodiments of the inventive concept. FIG. 2A is anequivalent circuit diagram for the memory cell array (MCA) of theintegrated circuit device 1 according to an embodiments of the inventiveconcept. FIGS. 2B and 2C are respective, cross-sectional views of theintegrated circuit device 1 according to embodiments of the inventiveconcept, wherein FIG. 2B is a cross-sectional view taken along a bitline BL and FIG. 2C is a cross-sectional view taken along a commonconnection wiring line 190X for electrically connecting (hereafter,“connecting”) an erase control line ECL.

Embodiments of the inventive concept relate generally to integratedcircuits including a vertically configured memory cell array MCA. Thus,the integrated circuit device 1 illustrated in FIGS. 1, 2A, 2B and 2C,is a vertical NAND (VNAND) flash memory device having a vertical channelstructure. In this regard, those skilled in the art will recognize thatthe terms “vertical” and “horizontal” are used to describe relativespatial orientations of constituent components and features. Forexample, a primary surface of a substrate may serve as a convenientgeometric reference from which various coordinate “directions” (e.g., X,Y, and Z directions) are defined, wherein one of these directions (e.g.,the Z direction) is identified as the vertical direction, and the otherdirections (e.g., the X direction and the Y direction) are identified asorthogonally-related horizontal directions. However, such relativespatial orientations and general geometric relationships are merelydescriptive in nature.

Using a primary, upper horizontal surface 110M of the principalsubstrate 110 as a reference, as shown for example in FIGS. 2A and 2B,the memory cell array MCA may be understood as including a plurality ofmemory cell strings MS that vertically extends from the substrate 110 inthe vertical direction. In certain embodiments of the inventive concept,the plurality of memory cell strings MS may be respectively disposed onthe substrate 110 along a plurality of vertically extending channelstructures 150.

Each of the plurality of memory cell strings MS may include aserially-connected arrangement of at least one ground selectiontransistor GST, a plurality of memory cells MC, at least one stringselection transistor SST, and at least one erase control transistor ECT.Here, each one of the plurality of memory cells MC may be used to storesingle-bit or multi-bit data, wherein word lines WL are respectivelyconnected to a corresponding memory cell MC and may be used to control,at least in part, the operation of the memory cell MC.

A gate terminal of the ground selection transistor GST may be connectedto a ground selection line GSL and a source terminal of the groundselection transistor GST may be connected to a common source line CSL. Agate terminal of the string selection transistor SST may be connected toa string selection line SSL, a source terminal of the string selectiontransistor SST may be connected to a drain terminal of a memory cellMCn, and a drain terminal of the string selection transistor SST may beconnected to the bit line BL through a source terminal of the erasecontrol transistor ECT. A gate terminal of the erase control transistorECT may be connected to the erase control line ECL, the source terminalof the erase control transistor ECT may be connected to the drainterminal of the string selection transistor SST, and a drain terminal ofthe erase control transistor ECT may be connected to the commonconnection wiring line 190X.

With the foregoing example in mind, it should be noted that each memorycell string MS may include; one ground selection transistor GST, onestring selection transistor SST, and one erase control transistor ECT.Alternately, each memory cell string MS may include multiple groundselection transistors GST, multiple string selection transistors SST,and multiple erase control transistors ECT. Alternately, each memorycell string MS may omit the ground selection transistor GST. However,these are just selected example, and memory cell string(s) of greatvariety may be used in various embodiments of the inventive concept.

When a signal is applied to the gate terminal of the string selectiontransistor SST through the string selection line SSL, the signal appliedthrough the bit line BL is provided to the plurality of memory cells MC.As a result, a data write operation may be performed. When a signal isapplied to the gate terminal of the erase control transistor ECT throughthe erase control line ECL, an erase operation for the plurality ofmemory cells MC may be performed using a gate induced drain leakage(GIDL) current generated by the erase control transistor ECT. In thisregard it should be noted that erase operations may be performed on aunit block by unit block basis using the GIDL current.

Referring to FIG. 1, the substrate 110 may be conceptually divided intoa memory cell region CR, a connection region IR, and a peripheralcircuit region PR. The substrate 110 may include a semiconductormaterial, for example, a Group IV semiconductor, a Group III-V compoundsemiconductor, or a Group II-VI oxide semiconductor. For example, theGroup IV semiconductor may include silicon (Si), germanium (Ge), orSi—Ge. The substrate 110 may be provided as a bulk wafer or an epitaxiallayer. In another embodiment, the substrate 110 may include asilicon-on-insulator (SOI) substrate or a germanium-on-insulator (GeOI)substrate.

Here, the memory cell array MCA may be disposed in the memory cellregion CR, and a plurality of driving transistors TR for driving thememory cell array MCA may be disposed in the peripheral circuit regionPR.

Assuming that the upper surface 110M of the substrate 110 ishorizontally defined by the first horizontal direction (i.e., the Xdirection) and the second horizontal direction (i.e., the secondhorizontal direction), the memory cell region CR, connection region IR,and peripheral circuit region PR may be understood as sequentiallyextending in the second horizontal direction along the substrate 110.That is, the peripheral circuit region PR may be separated from thememory cell region CR in the second horizontal direction by theintervening connection region IR.

Referring to FIGS. 1, 2A, 2B and 2C, a plurality of gate electrodes 120may be formed on the substrate 110 extending in the second horizontaldirection and spaced apart from each other in the vertical direction.Here, the plurality of gate electrodes 120 may extend in the secondhorizontal direction across the substrate 110, as well as upward in thevertical direction in a stepped arrangement along the second horizontaldirection.

In certain embodiments of the inventive concept, the plurality of gateelectrodes 120 may correspond to at least one ground selection line GSLthat configures a memory cell string MS, the plurality of word lines WL,at least one string selection line SSL, and at least one erase controlline ECL. For example, at least one gate electrode 120 a may be disposedlowermost among the memory cell array MCA and may function as the groundselection line GSL, at least one gate electrode 120 d may be disposeduppermost among of the memory cell array MCA and may function as theerase control line ECL, at least one gate electrode 120 c may bedisposed below the at least one gate electrode 120 d and may function asthe string selection line SSL, and a plurality of remaining gateelectrodes 120 b may function as respective word lines WL.

In the foregoing example and throughout the description that follows,certain geometric or spatially relative terms such as; “upper”, “lower”,“uppermost”, “lowermost”, “upward”, “downward”, “above”, and “below” maybe used in relation to previously assumed, descriptive relationships.For example, given a defined vertical relationship or direction, onecomponent may be said to be above or below another component.

In the foregoing example, among the plurality of gate electrodes 120, inorder to distinguish the plurality of gate electrodes 120 b thatfunction as the word lines WL from the gate electrodes 120 a, 120 c, and120 d that function as the ground selection line GSL, the stringselection line SSL, and the erase control line ECL, the plurality ofgate electrodes 120 b that function as the word lines WL may hereafterbe referred to as “word lines” and the gate electrodes 120 a, 120 c, and120 d that function as the ground selection line GSL, the stringselection line SSL, and the erase control line ECL may hereafter bereferred to as “gate lines.” Thus, it is understood that the pluralityof gate electrodes 120 may include a plurality of word lines and aplurality of gate lines.

The possible inclusion and use of one or more dummy line(s) is alsocontemplated in certain embodiments of the inventive concept. Forexample, one or more of the plurality of gate electrodes 120 (e.g., wordline(s) 120 b, string selection line(s) SSL 120 c, and/or erase controlline(s) ECL 120(d) may function as a dummy line. (See, e.g.,component(s) 120 e in FIGS. 8 through 13 hereafter).

In other embodiments (see, e.g., the examples described in relation toFIGS. 4A through 7 hereafter), among the plurality of gate electrodes120, at least one gate electrode 120 d-U in an uppermost portion (orposition) and at least one gate electrode 120 d-D in the lowermostportion may function as an upper erase control line ECL-U and a lowererase control line ECL-D. Alternatively, in other embodiments such asthose illustrated in FIGS. 16, 17 and 18, when the plurality of gateelectrodes 120 comprises at least two stacks ST1 and ST2, the at leastone gate electrode 120 d-U in the uppermost portion of each of thestacks ST1 and ST2 may function as each of upper erase control linesECL-U1 and ECL-U2. In some embodiments, the at least one gate electrode120 d-D in the uppermost portion of each of the stacks ST1 and ST2 mayfunction as each of the lower erase control lines ECL-D1 and ECL-D2.

As illustrated in FIGS. 2B and 2C, an insulating layer 130 may bedisposed between the substrate 110 and the lowermost gate electrode 120a, as well as between each of the plurality of gate electrodes 120. Inaddition, the insulating layer 130 may be disposed on the gate electrode120 d in the uppermost portion.

A plurality of word line cut regions WLC may be disposed in thesubstrate 110 extending in the second horizontal direction, where theplurality of gate electrodes 120 is disposed between adjacent word linecut regions WLC to configure one block. The adjacent pair of word linecut regions WLC may limit widths of the plurality of gate electrodes 120in the first horizontal direction. An intermediate word line cut regionWLCA may (optionally) be disposed between the pair of word line cutregions WLC in the second horizontal direction.

A plurality of common source lines 140 that vertically overlap theplurality of word line cut regions WLC may be disposed on the substrate110 in the second horizontal direction. In addition, a plurality ofintermediate common source lines 140A that vertically overlap theintermediate word line cut region WLCA may be disposed on the substrate110 in the second horizontal direction. An insulating spacer 142 may bedisposed on opposing sidewalls of each common source line 140, as wellas the intermediate common source lines 140A. For example, theinsulating spacer 142 may be disposed between each common source line140 and gate electrode 120, as well as between each intermediate commonsource line 140A and gate electrode 120. In certain embodiments of theinventive concept, the plurality of common source lines 140 and theplurality of common source lines 140A may extend below the main surface110M of the substrate 110.

A plurality of common source regions 144 may be selectively disposed inthe substrate 110 under the plurality of common source lines 140 in thesecond horizontal direction. The plurality of common source regions 144may be impurity regions doped with n-type impurities at high density.The plurality of common source regions 144 may function as respectivesource regions supplying electrical charge to memory cells. Theplurality of common source regions 144 may overlap the plurality of wordline cut regions WLC.

Each one of the plurality of channel structures 150 may verticallyextend upward through the memory cell region CR from the main surface110M of the substrate 110 through the plurality of gate electrodes 120in the Z direction. Here, the channel structures 150 may be spaced apartfrom one another at prescribed intervals in the first horizontaldirection, the second horizontal direction, and/or some diagonal (e.g.,a composite of the first and second horizontal directions) direction.Hence, in certain embodiments of the inventive concept, the plurality ofchannel structures 150 may be disposed in a zigzag or staggered pattern.

The plurality of channel structures 150 may be respectively disposed inchannel holes 150H that extend through the gate electrodes 120,insulating layer 130, and interlayer insulating layer 170. A gateinsulating layer 152 and a channel layer 154 may be sequentiallydisposed on an inner wall of each channel hole 150H. A buried insulatinglayer 156 may be disposed on the channel layer 154 to fill a space ineach of the channel holes 150H.

A conductive plug 158 contacting the channel layer 154 and closing anupper opening of each channel hole 150H may be disposed on each of thechannel holes 150H. In some embodiments, the conductive plug 158 mayinclude a semiconductor material doped with impurities at high densityand the channel layer 154 may include a semiconductor material that isnot doped with impurities or a semiconductor material doped withimpurities at lower density than the conductive plug 158. In otherembodiments, the buried insulating layer 156 is omitted and the channellayer 154 may be in a form of a pillar that fills a residual portion ofeach of the channel holes 150H. Although not shown, the integratedcircuit device 1 may further include a dummy channel structure forsecuring structural stability in processes of manufacturing theintegrated circuit device 1. The dummy channel structure may have asimilar structure to that of each of the plurality of channel structures150.

The gate insulating layer 152 may include a blocking dielectric layer152 a, a charge storage layer 152 b, and a tunnelling dielectric layer152 c that are sequentially formed from each of the plurality of gateelectrodes 120 to the channel layer 154. The blocking dielectric layer152 a may include a silicon oxide, a silicon nitride, or a metal oxidewith a larger dielectric constant than that of the silicon oxide. Themetal oxide may be a hafnium oxide, an aluminium oxide, a zirconiumoxide, a tantalum oxide, or a combination of the above oxides. Thecharge storage layer 152 b may include poly-silicon or poly-silicondoped with impurities. In some embodiments, the charge storage layer 152b may be a charge trap layer formed of the silicon nitride, a boronnitride, or a silicon boron nitride. The tunnelling dielectric layer 152c may include the silicon oxide, the hafnium oxide, the aluminium oxide,the zirconium oxide, or the tantalum oxide.

Each of the at least two gate electrodes 120 c and 120 d in theuppermost portion may be divided into at least two lines by a stringisolation insulating layer 160. For example, a string selection line cutregion SLC may extend between a word line cut region WLC and anintermediate word line cut region WLCA, or between a pair of word linecut regions WLC in the second horizontal direction and the stringisolation insulating layer 160 may be disposed in the string selectionline cut region SLC. Therefore, each of the erase control line ECL andthe string selection line SSL may have a lesser width than that of theword line WL in the first horizontal direction. The width of each of theerase control line ECL and the string selection line SSL in the firsthorizontal direction may be less than ½ the width of the word line WL inthe first horizontal direction. For example, relative to the width of aword line WL in the first horizontal direction, two physically separate(or divided) erase control lines ECL and/or two physically separatestring selection lines SSL may be disposed.

In some embodiments, a first width for each of the erase control linesECL and a second width for each of the string selection lines SSL in thefirst horizontal direction may be equal. However, when the stringisolation insulating layer 160 is tapered and accordingly, the stringisolation insulating layer 160 extending to the substrate 110 and awidth of the string isolation insulating layer 160 in the firsthorizontal direction is gradually reduced, the width of the erasecontrol line ECL in the first horizontal direction may be slightlygreater than the width of the string selection line SSL in the firsthorizontal direction.

In certain embodiments of the inventive concept, a plurality of bitlines BL may be spaced apart from one another at uniform intervals inthe second horizontal direction and may extend in the first horizontaldirection. The plurality of bit lines BL may be connected to theplurality of channel structures 150. For example, the plurality of bitlines BL and the plurality of channel structures 150 may be connectedthrough conductive studs 184 disposed on the conductive plugs 158 of theplurality of channel structures 150 and upper conductive vias 188disposed between the conductive studs 184 and the plurality of bit linesBL. In some embodiments, a pair of neighboring bit lines BL may bealternately connected through the plurality of channel structures 150,the conductive studs 184, and the upper conductive vias 188. However,the inventive concept is not limited thereto. The plurality of channelstructures 150 and the plurality of bit lines BL may be connected byvarious methods considering an arrangement method of the plurality ofchannel structures 150, a horizontal width of each of the plurality ofchannel structures 150, and/or a horizontal width of each of theplurality of bit lines BL.

The plurality of gate electrodes 120 and the plurality of drivingtransistors TR may be connected by a plurality of connection wiringlines 190. The plurality of gate electrodes 120 and the plurality ofconnection wiring lines 190 may be connected through lower conductivevias 182 connected onto parts of the plurality of gate electrodes 120 ofthe connection region IR and the conductive studs 184 disposed betweenthe lower conductive vias 182 and the plurality of connection wiringlines 190.

The plurality of driving transistors TR may be connected to theplurality of gate electrodes 120 initially. The plurality of drivingtransistors TR and the plurality of gate electrodes 120 may be connectedonly through conductive paths such as the lower conductive vias 182, theconductive studs 184, the plurality of connection wiring lines 190, orconductive via plugs (not shown) for connecting the plurality ofconnection wiring lines 190 to the plurality of driving transistors TR.

In the connection region IR, one end of the stepped gate electrode 120may be referred to as a pad layer connected to the lower conductive via182. The resulting heights of the plurality of lower conductive vias 182formed on the pad layer of the plurality of gate electrodes 120 in thevertical direction may vary in accordance with relative verticalposition(s) of the plurality of gate electrodes 120. The plurality ofconnection wiring lines 190 may extend from the pad layer of theplurality of gate electrodes 120 to the plurality of driving transistorsTR.

The plurality of connection wiring lines 190 may include; the commonconnection wiring line 190X, an extension connection wiring line 190E, astring connection wiring line 190S, and a gate connection wiring line190W. The common connection wiring line 190X and the extensionconnection wiring line 190E may be connected to the erase control lineECL, the string connection wiring line 190S may be connected to thestring selection line SSL, and the gate connection wiring line 190W maybe connected to the word line WL or a ground selection line CSL.

The plurality of driving transistors TR may include a word line drivingtransistor TR-W connected to the word line WL, a string selectiondriving transistor TR-S connected to the string selection line SSL, andan erase control driving transistor TR-E connected to the erase controlline ECL.

The word line driving transistor TR-W may be connected to the word lineWL through the gate connection wiring line 190W. In FIG. 1, only asingle word line driving transistor TR-W and only a single gateconnection wiring line 190W are shown in order to preserve illustrativeclarity. However, the integrated circuit device 1 may include aplurality of word line driving transistors TR-W and a plurality of gateconnection wiring lines 190W respectively connected to a plurality ofword lines WL disposed at different levels in the vertical direction.

The driving transistors TR may further include a ground selectiondriving transistor connected to the ground selection line GSL, and theplurality of connection wiring lines 190 may further include a groundselection connection wiring line for connecting the ground selectiondriving transistor to the ground selection line GSL. However, since theground selection connection wiring line and the ground selection drivingtransistor that are connected to the ground selection line GSL aresimilar to the gate connection wiring line 190W and the word linedriving transistor TR-W connected to the word line WL, the groundselection connection wiring line and the ground selection drivingtransistor are not illustrated or repetitively described.

The string selection driving transistor TR-S may be connected to thestring selection line SSL through the string connection wiring line190S. The integrated circuit device 1 may include a plurality of stringconnection wiring lines 190S and a plurality of string selection drivingtransistors TR-S respectively connected to a plurality of physicallydivided string selection lines SSL.

The erase control driving transistor TR-E may be connected to aplurality of erase control lines ECL through the common connectionwiring line 190X and the extension connection wiring line 190E. Thecommon connection wiring line 190X and the extension connection wiringline 190E may be referred to as erase control connection wiring lines.

The gate connection wiring line 190W, the string connection wiring line190S, and the extension connection wiring line 190E may extend in thefirst horizontal direction and/or the second horizontal direction.However, a layout configuration (e.g., the layout design, geometry, orshape) of the gate connection wiring line 190W, string connection wiringline 190S, and extension connection wiring line 190E shown in FIG. 1 isan example.

The plurality of physically divided string selection lines SSL arerespectively connected to the plurality of string selection drivingtransistors TR-S through the physically divided string connection wiringlines 190S. At least two of the plurality of physically divided erasecontrol lines ECL may be connected to the one erase control drivingtransistor TR-E by the one erase control connection wiring line. Thatis, the one common connection wiring line 190X and the one extensionconnection wiring line 190E may be connected to each other. The commonconnection wiring line 190X extending in the first horizontal direction(the direction in which the bit line BL extends) may be connected to atleast two erase control lines ECL. That is, the common connection wiringline 190X extending in the first horizontal direction and connects atleast two erase control lines ECL in the erase control connection wiringlines. For example, the common connection wiring line 190X may extendalong one end of each of the plurality of erase control lines ECL on theconnection region IR, that is, on the pad layer in the first horizontaldirection and may connect the plurality of erase control lines ECL inone block.

For example, the number of string selection driving transistors TR-Scorresponding to the physically divided string selection lines SSL maybe greater than the number of erase control driving transistors TR-Gcorresponding to the physically divided erase control lines ECL.

Since integrated circuit devices like the one illustrated in FIGS. 1,2A, 2B and 2C include a plurality of string selection drivingtransistors TR-S for individually driving a plurality of stringselection transistors SST, such integrated circuit devices mayindividually operate the plurality of memory cell strings MS.Accordingly, in order to simultaneously drive at least two of theplurality of erase control transistors ECT, an integrated circuit devicemay include a common connection wiring line 190X connecting at least twoerase control lines ECL and extending in the first horizontal direction,and an extension connection wiring line 190E for connecting the commonconnection wiring line 190X to the erase control driving transistorTR-G.

With this configuration, it is possible to minimize the number of erasecontrol connection wiring lines including the common connection wiringline 190X and the extension connection wiring line 190E. It is alsopossible to minimize a layout area required for the connection wiringline 190 and a layout area occupied by the erase control drivingtransistor TR-G. As a result, the plurality of memory cells MC of theintegrated circuit device 1 may be more easily and effectivelycontrolled without a corresponding increase in the layout area occupiedby an integrated circuit device according to embodiments of theinventive concept.

FIG. 3A is an equivalent circuit diagram of a memory cell array of anintegrated circuit device 1 a according to embodiments of the inventiveconcept, and FIG. 3B is a cross-sectional view of the integrated circuitdevice 1 a taken along a common connection wiring line 190Xa forconnecting the erase control line ECL. Here, the undescribed portions ofthe integrated circuit device 1 a may be similar in configuration andoperation to the integrated circuit device 1 previously described inrelation to FIGS. 1, 2A, 2B and 2C.

Referring to FIGS. 3A and 3B, the integrated circuit device 1 a mayinclude a plurality of connection wiring lines 190 a, wherein theplurality of connection wiring lines 190 a includes the commonconnection wiring line 190Xa, the extension connection wiring line(refer to 190E of FIG. 1), the string connection wiring line 190S, andthe gate connection wiring line 190W. The common connection wiring line190Xa and the extension connection wiring line 190E may be connected tothe erase control line ECL, the string connection wiring line 190X maybe connected to the string selection line SSL, and the gate connectionwiring line 190W may be connected to the word line WL or the groundselection line CSL. The common connection wiring line 190Xa and theextension connection wiring line 190E may be referred to as the erasecontrol connection wiring lines.

The common connection wiring line 190Xa extending in the firsthorizontal direction (the direction in which the bit lines BL extend, asshown in of FIG. 1) may be connected to the at least two erase controllines ECL. That is, the common connection wiring line 190Xa extending inthe first horizontal direction may be connected to the at least twoerase control lines ECL in the erase control connection wiring lines.For example, a plurality of common connection wiring lines 190Xaextending in the first horizontal direction and may be connected the atleast two erase control lines ECL among the plurality of erase controllines ECL in one block.

The common connection wiring line 190X previously described in relationto FIGS. 1, 2A, 2B and 2C may be connected to the plurality of erasecontrol lines ECL in one block. However, in FIGS. 3A and 3B, each of theat least two common connection wiring lines 190Xa physically divided inthe first horizontal direction may be connected to at least twodifferent erase control lines ECL among the plurality of erase controllines ECL in one block.

In addition, the at least two common connection wiring lines 190Xaphysically divided in the first horizontal direction may be respectivelyconnected to at least two erase control driving transistors (see, e.g.,component TR-E in FIG. 1).

FIG. 4A is an equivalent circuit diagram for a memory cell array of anintegrated circuit device 2 or 2 a according to embodiments of theinventive concept. FIGS. 4B and 4C are respective cross-sectional viewsof the integrated circuit devices 2 and 2 a taken along the commonconnection wiring line 190X for connecting the upper erase controlelectrode ECL-U. Here, the undescribed portions of the integratedcircuit devices 2 and 2 a may be respectively similar in configurationand operation to one or more of the integrated circuit devicespreviously described in relation to FIGS. 1 through 3B, inclusive.

Referring to FIGS. 4A, 4B and 4C, each of the integrated circuit devices2 and 2 a may include a plurality of gate electrodes 120. Each of theplurality of memory cell string MS may include a lower erase controltransistor ECT-D, a ground selection transistor GST, a plurality ofmemory cells MC, a string selection transistor SST, and an upper erasecontrol transistor ECT-U that are serially connected to each other. Inexemplary embodiments, the plurality of gate electrodes 120 maycorrespond to at least one lower erase control line ECL-D thatconfigures the memory cell string MS, at least one ground selection lineGSL, a plurality of word lines WL, at least one string selection lineSSL, and at least one upper erase control line ECL-U. A gate terminal ofthe upper erase control transistor ECT-U may be connected to the uppererase control line ECL-U and a gate terminal of the lower erase controltransistor ECT-D may be connected to the lower erase control line ECL-D.The upper erase control line ECL-U and the upper erase controltransistor ECT-U may be the same as the erase control line ECL and theerase control transistor ECT described with reference to FIGS. 1 through3B.

For example, at least one gate electrode 120 d-D or 120 d-Da in thelowermost portion functions as the at least one lower erase control lineECL-D, the at least one gate electrode 120 a above the at least one gateelectrode 120 d-D or 120 d-Da that functions as the at least one lowererase control line ECL-D functions as the ground selection line GSL, theat least one gate electrode 120 d-U in the uppermost portion functionsas the upper erase control line ECL-U, the at least one gate electrode120 c below the at least one gate electrode 120 d-U in the uppermostportion, which functions as the upper erase control line ECL-U,functions as the string selection line SSL, and the plurality ofremaining gate electrodes 120 b may function as the word lines WL.

Each of the at least two gate electrodes 120 c and 120 d-U in theuppermost portion may be divided into at least two lines by the stringisolation insulating layer 160 on a plane. For example, between the wordline cut region WLC and the intermediate word line cut region WLCA orbetween the pair of word line cut regions WLC, the string selection linecut region SLC may extend in the second horizontal direction and thestring isolation insulating layer 160 may be disposed in the stringselection line cut region SLC. Therefore, each of the upper erasecontrol line ECL-U and the string selection line SSL may have a lesserwidth than that of the word line WL in the first horizontal direction.The width of each of the upper erase control line ECL-U and the stringselection line SSL in the first horizontal direction may be less than ½of the width of the word line WL in the first horizontal direction. Forexample, in the width of the one word line WL in the first horizontaldirection, the two physically divided upper erase control lines ECL-Uand the two physically divided string selection lines SSL may bedisposed.

Referring to FIG. 4B, the at least one gate electrode 120 d-D in thelowermost portion of the integrated circuit device 2 may have the samewidth as that of the at least two gate electrodes 120 a and 120 b abovethe at least one gate electrode 120 d-D in the lowermost portion. Forexample, in the width of the one word line WL in the first horizontaldirection, the one physically divided lower erase control line ECL-D maybe disposed.

However, when the word line cut region WLC and/or the intermediate wordline cut region WLCA extend toward the substrate 110 and the widththereof in the first horizontal direction is gradually reduced andaccordingly, the word line cut region WLC and/or the intermediate wordline cut region WLCA are tapered, a width of the lower erase controlline ECL-D in the first horizontal direction may be slightly greaterthan that of the width of the word line WL in the first horizontaldirection.

Referring to FIG. 4C, the at least one gate electrode 120 d-Da in thelowermost portion of the integrated circuit device 2 a may be dividedinto at least two lines on a plane. The lower erase control line ECL-Dmay have a lesser width than that of the word line WL in the firsthorizontal direction. The width of the lower erase control line ECL-D inthe first horizontal direction may be less than ½ of the width of theword line WL in the first horizontal direction. For example, in thewidth of the one word line WL in the first horizontal direction, the twophysically divided lower erase control lines ECL-D may be disposed.

Referring to FIGS. 4A, 4B and 4C, the common connection wiring line 190Xextending in the first horizontal direction may be connected to aplurality of upper erase control lines ECL-U in one block. The pluralityof lower erase control lines ECL-D in the one block may be connected. Insome embodiments, the plurality of lower erase control lines ECL-D inthe one block may be connected to the common connection wiring line 190Xfor connecting the plurality of upper erase control lines ECL-U in theone block by a similar connection wiring line. In other embodiments, theplurality of lower erase control lines ECL-D in the one block may beconnected by a conductive region formed in the substrate 110.

The number of connected upper erase control transistors ECT-U may equalto the number of connected lower erase control transistors ECT-D.

For example, the integrated circuit device 2 illustrated in FIG. 4B isconnected to four physically divided upper erase control lines ECL-U ina horizontal direction and may be connected to the two physicallydivided lower erase control lines ECL-D in the horizontal direction. Thenumber of lower erase control transistors ECT-D connected to the onephysically divided lower erase control line ECL-D may be twice thenumber of upper erase control transistors ECT-U connected to onephysically divided upper erase control line ECL-U.

For example, the integrated circuit device 2 a illustrated in FIG. 4C isconnected to the four physically divided upper erase control lines ECL-Uin the horizontal direction and may be connected to four physicallydivided lower erase control lines ECL-D in the horizontal direction. Thenumber of lower erase control transistors ECT-D connected to the onephysically divided lower erase control line ECL-D may equal to thenumber of upper erase control transistors ECT-U connected to onephysically divided upper erase control line ECL-U.

FIGS. 5, 6 and 7 are corresponding equivalent circuit diagrams formemory cell arrays for integrated circuit devices 2 b, 2 c, and 2 daccording to embodiments of the inventive concept.

Referring to FIG. 5, in the integrated circuit device 2 b, the number ofconnected upper erase control transistors ECT-U may be greater than thenumber of connected lower erase control transistors ECT-D. For example,the number of connected upper erase control transistors ECT-U may betwice or no less than twice the number of connected lower erase controltransistors ECT-D.

For example, the upper erase control line ECL-U in one block of theintegrated circuit device 2 b illustrated in FIG. 5 is physicallydivided into four in the horizontal direction like the upper erasecontrol line ECL-U of each of the integrated circuit devices 2 and 2 aillustrated in FIGS. 4A and 4B and the four physically divided uppererase control lines ECL-U may be connected. For example, the lower erasecontrol line ECL-D in the one block of the integrated circuit device 2 billustrated in FIG. 5 is physically divided into two in the horizontaldirection like the lower erase control line ECL-D of the integratedcircuit device 2 of FIG. 4A and the two physically divided lower erasecontrol lines ECL-D are connected or the lower erase control line ECL-Din the one block of the integrated circuit device 2 b illustrated inFIG. 5 is physically divided into four in the horizontal direction likethe lower erase control line ECL-D of the integrated circuit device 2 aillustrated in FIG. 4B and the four physically divided lower erasecontrol lines ECL-D may be connected.

Referring to FIG. 6, in the integrated circuit device 2 c, the number ofconnected upper erase control transistors ECT-U may be less than thenumber of connected lower erase control transistors ECT-D. For example,the number of connected lower erase control transistors ECT-D may betwice or no less than twice the number of connected upper erase controltransistors ECT-U.

For example, the upper erase control line ECL-U in one block of theintegrated circuit device 2 c illustrated in FIG. 6 is physicallydivided into four in the horizontal direction like the upper erasecontrol line ECL-U of the integrated circuit device 1 a illustrated inFIGS. 3A and 3B and the four physically divided upper erase controllines ECL-U may be connected by twos.

For example, the lower erase control line ECL-D in the one block of theintegrated circuit device 2 c illustrated in FIG. 6 is physicallydivided into two in the horizontal direction like the lower erasecontrol line ECL-D of the integrated circuit device 2 illustrated inFIG. 4A and the two physically divided lower erase control lines ECL-Dmay be connected or the lower erase control line ECL-D in the one blockof the integrated circuit device 2 c illustrated in FIG. 6 is physicallydivided into four in the horizontal direction like the lower erasecontrol line ECL-D of the integrated circuit device 2 a illustrated inFIG. 4B and the four physically divided lower erase control lines ECL-Dmay be connected by twos.

Referring to FIG. 7, in the integrated circuit device 2 d, the number ofconnected upper erase control transistors ECT-U may equal to the numberof connected lower erase control transistors ECT-D.

For example, the upper erase control line ECL-U in one block of theintegrated circuit device 2 d illustrated in FIG. 7 is physicallydivided into four in the horizontal direction like the upper erasecontrol line ECL-U of the integrated circuit device 1 a illustrated inFIGS. 3A and 3B and the four physically divided upper erase controllines ECL-U may be connected by twos.

For example, the lower erase control line ECL-D in one block of theintegrated circuit device 2 d illustrated in FIG. 7 is physicallydivided into two in the horizontal direction like the lower erasecontrol line ECL-D of the integrated circuit device 2 illustrated inFIG. 4A and the two physically divided lower erase control lines ECL-Dare not connected or the lower erase control line ECL-D in one block ofthe integrated circuit device 2 d illustrated in FIG. 7 is physicallydivided into four in the horizontal direction like the lower erasecontrol line ECL-D of the integrated circuit device 2 a illustrated inFIG. 4B and the four physically divided lower erase control lines ECL-Dmay be connected by twos.

FIG. 8 is a cross-sectional view of an integrated circuit device 3according to embodiments of the inventive concept taken along the bitline BL. Here, the undescribed portions of the integrated circuit device3 may be similar in configuration and operation to one or more of theintegrated circuit devices previously described in relation to FIGS. 1through 7, inclusive.

Referring to FIG. 8, the integrated circuit device 3 may include theplurality of gate electrodes 120. The at least one gate electrode 120 ain the lowermost portion functions as the ground selection line GSL, theat least one gate electrode 120 d in the uppermost portion functions asthe erase control line ECL, the at least one gate electrode 120 c belowthe at least one gate electrode 120 d in the uppermost portion, whichfunctions as the erase control line ECL, functions as the stringselection line SSL, at least one gate electrode 120 e below the at leastone gate electrode 120 c in the uppermost portion, which functions asthe string selection line SSL, may be a dummy word line DWL, and theplurality of remaining gate electrodes 120 b may function as the wordlines WL.

In this regard, the dummy word line DWL may be disposed between thestring selection line SSL and the word line WL to reduce electricalinterference between the string selection line SSL and the word line WL.Alternately or additionally, a dummy word line DWL may be disposedbetween the string selection line SSL and the erase control line ECL(e.g., the uppermost portion among the plurality of gate electrodes120).

FIGS. 9A, 9B, 9C, 9D and 9E are respective cross-sectional views takenalong the dashed line region IX of the integrated circuit device 3 shownin FIG. 8.

Referring to FIG. 9A, the channel structure 150 may be disposed in thechannel hole 150H. The gate insulating layer 152 and the channel layer154 may be sequentially disposed on the inner wall of the channel hole150H such that the buried insulating layer 156 fills the residual spaceof the channel hole 150H. The conductive plug 158 that contacts thechannel layer 154 and covers the entrance of the channel hole 150H maybe disposed on the channel hole 150H.

The gate insulating layer 152 may include the blocking dielectric layer152 a, the charge storage layer 152 b, and the tunnelling dielectriclayer 152 c sequentially formed on the gate electrode 120 toward thechannel layer 154.

The uppermost end of the gate insulating layer 152 may be disposed atthe same level as that of an upper surface of the gate electrode 120 din the uppermost portion among the plurality of gate electrodes 120. Theuppermost end of the gate insulating layer 152 and the uppermost end ofthe channel layer 154 may be disposed at the same level. The lowermostend of the conductive plug 158 may be disposed at the same level as orat a lower level than that of the upper surface of the gate electrode120 d in the uppermost portion among the plurality of gate electrodes120.

Referring to FIG. 9B, the uppermost end of the gate insulating layer 152may be disposed at a higher level than that of the upper surface of thegate electrode 120 d in the uppermost portion among the plurality ofgate electrodes 120. The uppermost end of the channel layer 154 may bedisposed at a lower level than that of the uppermost end of the gateinsulating layer 152. The lowermost end of the conductive plug 158 maybe disposed at the same level as or at a lower level than that of theupper surface of the gate electrode 120 d in the uppermost portion amongthe plurality of gate electrodes 120.

Referring to FIG. 9C, the uppermost end of the gate insulating layer 152may be disposed at a higher level than that of the upper surface of thegate electrode 120 d in the uppermost portion among the plurality ofgate electrodes 120. The lowermost end of the conductive plug 158 may bedisposed at the same level as or at a lower level than that of the uppersurface of the gate electrode 120 d in the uppermost portion among theplurality of gate electrodes 120.

Referring to FIG. 9D, the gate insulating layer 152 may include theblocking dielectric layer 152 a, the charge storage layer 152 b, thetunnelling dielectric layer 152 c, and the gate dielectric layer 152 d.

The uppermost end of each of the blocking dielectric layer 152 a, thecharge storage layer 152 b, and the tunnelling dielectric layer 152 cmay be disposed at a level between a level of a lower surface of thegate electrode 120 d in the uppermost portion and a level of an uppersurface of the gate electrode 120 c in the uppermost portion among theplurality of gate electrodes 120. The gate dielectric layer 152 d mayface a side surface of the gate electrode 120 d in the uppermost portionamong the plurality of gate electrodes 120. The thickness of the gatedielectric layer 152 d that faces the side surface of the gate electrode120 d in the uppermost portion may be less than that of a second widthW2 that is the sum of widths for the blocking dielectric layer 152 a,the charge storage layer 152 b, and the tunnelling dielectric layer 152c in the horizontal direction.

That is, among the plurality of gate electrodes 120, a first width W1that is a thickness of the gate insulating layer 152 facing the sidesurface of the gate electrode 120 d in the uppermost portion (e.g., theerase control line ECL), may be less than that of a second width W2 thatis a thickness of the gate insulating layer 152 facing side surfaces ofthe remaining gate electrodes 120 (e.g., the string selection line SSL),the dummy word line DWL, and the word line WL.

Referring to FIG. 9E, the gate insulating layer 152 may include theblocking dielectric layer 152 a, the charge storage layer 152 b, thetunnelling dielectric layer 152 c, and the gate dielectric layer 152 d.

The uppermost end of each of the blocking dielectric layer 152 a, thecharge storage layer 152 b, and the tunnelling dielectric layer 152 cmay be disposed at a level between a level of an upper surface of theword line WL and a level of a lower surface of the dummy gate line DWLin the uppermost portion among the plurality of gate electrodes 120. Thegate dielectric layer 152 d may face side surfaces of the erase controlline ECL, the string selection line SSL, and the dummy word line DWLamong the plurality of gate electrodes 120. A first width W1 a of thegate dielectric layer 152 d in the horizontal direction, that is, thethickness of the gate dielectric layer 152 d that faces the sidesurfaces of the erase control line ECL, the string selection line SSL,and the dummy word line DWL, may be less than a second width W2 a thatis the sum of the widths of the blocking dielectric layer 152 a, thecharge storage layer 152 b, and the tunnelling dielectric layer 152 c inthe horizontal direction.

In some embodiments, the uppermost end of each of the blockingdielectric layer 152 a, the charge storage layer 152 b, and thetunnelling dielectric layer 152 c may be disposed at a level between alevel of an upper surface of the dummy gate line DWL and a level of alower surface of the string selection line SSL. That is, the gatedielectric layer 152 d faces the side surfaces of the erase control lineECL and the string selection line SSL and the blocking dielectric layer152 a, the charge storage layer 152 b, and the tunnelling dielectriclayer 152 c may face the side surfaces of the word line WL and the dummyword line DWL.

In each of FIGS. 9A, 9B, 9C, 9D and 9E (hereafter, 9A through 9E,inclusive), one erase control line ECL, one string selection line SSL,and one dummy word line DWL are respectively illustrated. However, thescope of the inventive concept is not limited thereto. At least one ofthe erase control line ECL, the string selection line SSL, and the dummyword line DWL may include multiple lines. In this case, an uppersurface, a lower surface, and a side surface of the erase control lineECL illustrated in FIGS. 9A through 9E respectively, may define an uppersurface of the erase control line ECL in the uppermost side, a lowersurface of the erase control line ECL in the lowermost side, and sidesurfaces of the plurality of erase control lines ECL among the pluralityof erase control lines ECL. An upper surface, a lower surface, and aside surface of the string selection line SSL may respectively define anupper surface of the string selection line SSL in the uppermost side, alower surface of the string selection line SSL in the lowermost side,and side surfaces of the plurality of string selection lines SSL amongthe plurality of string selection lines SSL. An upper surface, a lowersurface, and a side surface of the dummy word line DWL may respectivelydefine an upper surface of the dummy word line DWL in the uppermostside, a lower surface of the dummy word line DWL in the lowermost side,and side surfaces of the plurality of dummy word lines DWL among theplurality of dummy word lines DWL.

FIG. 10A is an equivalent circuit diagram for a memory cell array of anintegrated circuit device 4 according an embodiments of the inventiveconcept. FIG. 10B is a plan view further illustrating the integratedcircuit device 4, and FIG. 10C is a cross-sectional view of theintegrated circuit device 4 taken along a second common connectionwiring line 190X2 for connecting a second erase control electrode ECL2.Here, the undescribed portions of the integrated circuit device 3 may besimilar in configuration and operation to one or more of the integratedcircuit devices previously described in relation to FIGS. 1 through 9E,inclusive.

Referring to FIGS. 10A, 10B and 10C, the integrated circuit device 4includes at least two erase control lines ECL, at least one stringselection line SSL, at least one dummy word line DWL, a plurality ofword lines WL, and at least one ground selection line GSL. However, theintegrated circuit device 4 may include at least two string selectionlines SSL, and in some embodiments, the integrated circuit device 4 mayinclude at least two dummy word lines DWL.

The at least two erase control lines ECL may be at least two gateelectrodes 120 d in the uppermost end among the plurality of gateelectrodes 120. For example, the at least two erase control lines ECLmay include a first erase control line ECL1 that is the gate electrode120 d in the second uppermost end and the second erase control line ECL2that is the gate electrode 120 d in the uppermost end among theplurality of gate electrodes 120. Among the plurality of gate electrodes120, the first erase control line ECL1 that is the gate electrode 120 din the second uppermost end may extend further from the memory cellregion CR in the second horizontal direction than the second erasecontrol line ECL2 that is the gate electrode 120 d in the uppermost end.That is, an end of the first erase control line ECL1 that faces theperipheral circuit region PR may extend further from the memory cellregion CR to the outside than an end of the second erase control lineECL2.

The plurality of connection wiring lines 190 may include a first commonconnection wiring line 190X1, the second common connection wiring line190X2, a first string connection wiring line 190S1, a second stringconnection wiring line 190S2, and the gate connection wiring line 190W.

The first common connection wiring line 190X1 and the second commonconnection wiring line 190X2 may be respectively connected to the firsterase control line ECL1 and the second erase control line ECL2. Thefirst string connection wiring line 190S1 and the second stringconnection wiring line 190S2 may be respectively connected to a firststring selection line SSL1 and a second string selection line SSL2. Thegate connection wiring line 190W may be connected to the word line WL orthe ground selection line GSL.

In FIG. 10B, the first string connection wiring line 190S1 connected tothe first string selection line SSL1 is not illustrated. However, aswill be apparent to those skilled in the art, the first stringconnection wiring line 190S1 may connect the second string selectionline SSL2 and the string selection driving transistor TR-S like thesecond string connection wiring line 190S2 or shares the second stringconnection wiring line 190S2 connected to the second string selectionline SSL2 that overlaps in the vertical direction and may be connectedto the string selection driving transistor TR-S.

The number of first erase control transistors ECT1 connected by thefirst common connection wiring line 190X1 may be equal to the number ofsecond erase control transistors ECT2 connected by the second commonconnection wiring line 190X2. For example, the first common connectionwiring line 190X1 and the second common connection wiring line 190X2extend in the first horizontal direction and may be connected to theplurality of first erase control lines ECL1 and the plurality of seconderase control lines ECL2 in one block.

The number of first erase control transistors ECT1 and second erasecontrol transistors ECT2 that may be connected to the first commonconnection wiring line 190X1 and the second common connection wiringline 190X2 may be greater than the number of first string selectiontransistors SST1 and second string selection transistors SST2 that areconnected by the first string selection line SSL1 and the second stringselection line SSL2.

FIG. 11 is an equivalent circuit diagram for a memory cell array of anintegrated circuit device 4 a according to embodiments of the inventiveconcept. Here, the undescribed portions of the integrated circuit device4 a may be similar in configuration and operation to one or more of theintegrated circuit devices previously described in relation to FIGS. 1through 10C, inclusive.

Referring to FIG. 11, the integrated circuit device 4 a includes atleast two erase control lines ECL, at least one string selection lineSSL, a plurality of word lines WL, and at least one ground selectionline GSL. In some embodiments, the integrated circuit device 4 a mayinclude at least two string lines SSL.

The at least two erase control lines ECL may be at least two gateelectrodes 120 d in the uppermost end among the plurality of gateelectrodes 120. For example, the at least two erase control lines ECLmay include the first erase control line ECL1 that is the gate electrode120 d in the second uppermost end and the second erase control line ECL2that is the gate electrode 120 d in the uppermost end among theplurality of gate electrodes 120.

The plurality of connection wiring lines 190 may include a first commonconnection wiring line 190X1 a, the second common connection wiring line190X2, the first string connection wiring line 190S1, the second stringconnection wiring line 190S2, and the gate connection wiring line 190W.The layout configuration for the first common connection wiring line190X1 a may be similar to that of the common connection wiring line190Xa illustrated in FIG. 3B, and the layout configuration of the secondcommon connection wiring line 190X2 may be similar to that of the commonconnection wiring line 190X illustrated in FIG. 2C.

The number of first erase control transistors ECT1 connected by thefirst common connection wiring line 190X1 a may be less than the numberof second erase control transistors ECT2 connected by the second commonconnection wiring line 190X2. For example, the first common connectionwiring line 190X1 a extending in the first horizontal direction may beplural and may be connected to the at least two erase control lines ECLamong a plurality of first erase control lines ECL1 in one block. Thesecond common connection wiring line 190X2 extending in the firsthorizontal direction may be connected to the plurality of second erasecontrol lines ECL2 in the one block.

The number of first erase control transistors ECT1 and second erasecontrol transistors ECT2 that are connected by the first commonconnection wiring line 190X1 a and the second common connection wiringline 190X2 may be greater than the number of first string selectiontransistors SST1 and second string selection transistors SST2 that areconnected by the first string selection line SSL1 and the second stringselection line SSL2.

FIG. 12 is a cross-sectional view of an integrated circuit device 5according to embodiments of the inventive concept taken along the commonconnection wiring line 190X for connecting an erase control electrodeECLa. Here, the undescribed portions of the integrated circuit device 5may be similar in configuration and operation to one or more of theintegrated circuit devices previously described in relation to FIGS. 1through 11, inclusive.

Referring to FIG. 12, the integrated circuit device 5 includes the atleast one erase control line ECLa, the at least two string selectionlines SSL, the at least one dummy word line DWL, the plurality of wordlines WL, and the at least one ground selection line GSL. In someembodiments, the integrated circuit device 5 may include the at leasttwo dummy word lines DWL.

A first thickness T1 associated with a thickness of the erase controlline ECLa may be greater than a second thickness T2 associated with athickness of the string selection line SSL, a third thickness T3associated with a thickness of the dummy gate line DWL, and/or a fourththickness T4 associated with a thickness of a gate line WL. In someembodiments, a fifth thickness T5 associated with a thickness of theground selection line GSL may be greater than the second thickness T2,the third thickness T3, and/or the fourth thickness T4. In someembodiments, the first thickness T1 may be greater than or equal to thefifth thickness T5.

FIG. 13 is a cross-sectional view of an integrated circuit device 6according to embodiments of the inventive concept. Here, the undescribedportions of the integrated circuit device 6 may be similar inconfiguration and operation to one or more of the integrated circuitdevices previously described in relation to FIGS. 1 through 12,inclusive.

Referring to FIG. 13, the integrated circuit device 6 includes the atleast one erase control line ECL, the at least one string selection lineSSL, the at least two dummy word lines DWL, the plurality of word linesWL, and the at least one ground selection line GSL.

The at least two dummy word lines DWL may include a first dummy wordline DWL1 disposed between the at least one erase control line ECL andthe at least one string selection line SSL and a second dummy word lineDWL2 disposed above the at least one erase control line ECL. In someembodiments, the at least two dummy word lines DWL may further include athird dummy word line disposed between the at least one string selectionline SSL and the plurality of word lines WL.

The first thickness T1 associated with a thickness of the erase controlline ECLa may be greater than a second thickness T2 associated with athickness of the string selection line SSL, a third thickness T3associated with a thickness of the dummy gate line DWL, and/or a fourththickness T4 associated with a thickness of the gate line WL. In someembodiments, a fifth thickness T5 associated with a thickness of theground selection line GSL may be greater than the second thickness T2,the third thickness T3, and/or the fourth thickness T4. In someembodiments, the first thickness T1 may be greater than or equal to thefifth thickness T5.

FIG. 14 is an equivalent circuit diagram for a memory cell array of anintegrated circuit device 7 according to embodiments of the inventiveconcept. Here, the undescribed portions of the integrated circuit device7 may be similar in configuration and operation to one or more of theintegrated circuit devices previously described in relation to FIGS. 1through 13, inclusive.

Referring to FIG. 14, the integrated circuit device 7 comprises at leasttwo blocks including a first block BK1 and a second block BK2.

A plurality of connection wiring lines 190 b may include a commonconnection wiring line 190Xb, the string connection wiring line 190S,and the gate connection wiring line 190W. The common connection wiringline 190Xb may connect erase control lines ECL in different blocks, thatis, the erase control line ECL in the first block BK1 and the erasecontrol line ECL in the second block BK2. For example, the commonconnection wiring line 190Xb may connect an erase control transistor ECTin the first block BK1 and an erase control transistor ECT in the secondblock BK2.

FIG. 15 is an equivalent circuit diagram for a memory cell array of anintegrated circuit device 7 according to embodiments of the inventiveconcept. Here, the undescribed portions of the integrated circuit device5 may be similar in configuration and operation to one or more of theintegrated circuit devices previously described in relation to FIGS. 1through 14, inclusive.

Referring to FIG. 15, the integrated circuit device 7 comprises at leasttwo blocks including a common block BK-N and a spare block BK-S. Thespare block BK-S may have at least two sub-blocks including a firstsub-block BK-S1 and a second sub-block BK-S2. When a defect occurs inone of a plurality of memory cell strings MS of the common block BK-N,the spare block BK-S may provide a memory cell string MS that replacesthe memory cell string MS with the defect.

The common connection wiring line 190X of the common block BK-N mayconnect a plurality of erase control transistors ECT of the common blockBK-N as illustrated in FIGS. 1 to 2D. On the other hand, the commonconnection wiring line 190Xa of the spare block BK-S may be plural andmay connect at least two erase control transistors ECT among a pluralityof erase control transistors ECT of the spare block BK-S. For example,one of the plurality of common connection wiring lines 190Xa of thespare block BK-S connects all of a plurality of erase controltransistors ECT in the first sub-block BK-S1 and another one of theplurality of common connection wiring lines 190Xa of the spare blockBK-S may connect all of a plurality of erase control transistors ECT inthe first sub-block BK-S1.

FIGS. 16, 17 and 18 are respective cross-sectional views of integratedcircuit devices 9, 9 a, and 9 b according to embodiments of theinventive concept. Here, the undescribed portions of the integratedcircuit devices 9, 9 a and 9 b may be respectively similar inconfiguration and operation to one or more of the integrated circuitdevices previously described in relation to FIGS. 1 through 15,inclusive.

Referring to FIGS. 16, 17 and 18, each of the integrated circuit devices9, 9 a, and 9 b comprises a plurality of stacks including a first stackstructure ST1 in a lower portion and a second stack structure ST2 in anupper portion.

In each of the integrated circuit devices 9, 9 a, and 9 b, afterpreviously forming the plurality of gate electrodes 120 and theplurality of channel holes 150H of the first stack structure ST1, theplurality of gate electrodes 120 and the plurality of channel holes 150Hof the second stack structure ST2 may be formed on the first stackstructure ST1. In some embodiments, the gate insulating layer 152, thechannel layer 154, and the buried insulating layer 156 included in eachof the plurality of channel structures 150 may be integrated in each ofthe plurality of channel holes 150H of the first stack structure ST1 andeach of the plurality of channel holes 150H of the second stackstructure ST2. In other embodiments, the gate insulating layer 152, thechannel layer 154, and the buried insulating layer 156 included in eachof the plurality of channel structures 150 may be separately formed ineach of the plurality of channel holes 150H of the first stack structureST1 and each of the plurality of channel holes 150H of the second stackstructure ST2.

Each of the plurality of channel holes 150H of the first stack structureST1 and each of the plurality of channel holes 150H of the second stackstructure ST2 may be tapered so that a width in the horizontaldirections is reduced from an upper portion toward a lower portion. Eachof the plurality of channel holes 150H may have a step difference at aboundary between the first stack structure ST1 and the second stackstructure ST2. For example, a width of the uppermost end of each of theplurality of channel holes 150H of the first stack structure ST1 in thehorizontal directions may be greater than a width of the lowermost endof each of the plurality of channel holes 150H of the second stackstructure ST2.

Referring to FIG. 16, in the integrated circuit device 9, the gateinsulating layer 152, the channel layer 154, and the buried insulatinglayer 156 included in each of the plurality of channel structures 150 ofthe first stack structure ST1 and each of the plurality of channelstructures 150 of the second stack structure ST2 may be directlyconnected.

The first stack structure ST1 may have the upper erase control linesECL-U1 and the upper erase control lines ECL-U2. That is, the firststack structure ST1 may have the ground selection lines GSL and may nothave the string selection lines SSL and the second stack structure ST2may have the string selection lines SSL and may not have the groundselection lines GSL.

The number of upper erase control lines ECL-U2 of the second stackstructure ST2, which are disposed in the first horizontal direction, maybe equal to the number of string selection lines SSL and may be greaterthan the number of upper erase control lines ECL-U1 of the first stackstructure ST1.

Referring to FIG. 17, in the integrated circuit device 9 a, connectionconductive plugs 158M may be disposed between the plurality of channelstructures 150 of the first stack structure ST1 and the plurality ofchannel structures 150 of the second stack structure ST2. For example,the connection conductive plugs 158M may include the same material asthat of the conductive plugs 158.

The first stack structure ST1 may have the upper erase control linesECL-U1 and lower erase control lines ECL-D1. The second stack structureST2 may have the upper erase control lines ECL-U2 and lower erasecontrol lines ECL-D2. That is, the first stack structure ST1 may havethe ground selection lines GSL and may not have the string selectionlines SSL and the second stack structure ST2 may have the stringselection lines SSL and may not have the ground selection lines GSL.

In the integrated circuit device 9 a, the number of upper erase controllines ECL-U2 of the second stack structure ST2, which are disposed inthe first horizontal direction, may be equal to the number of stringselection lines SSL and may be greater than the number of lower erasecontrol lines ECL-D2 of the second stack structure ST2, the number ofupper erase control lines ECL-U1 of the first stack structure ST1, andthe number of lower erase control lines ECL-D1 of the first stackstructure ST1. For example, the number of upper erase control linesECL-U2 of the second stack structure ST2 may be twice the number oflower erase control lines ECL-D2 of the second stack structure ST2, thenumber of upper erase control lines ECL-U1 of the first stack structureST1, and the number of lower erase control lines ECL-D1 of the firststack structure ST1. In some embodiments, the number of upper erasecontrol lines ECL-U2 of the second stack structure ST2, which aredisposed in the first horizontal direction, may be equal to the numberof upper erase control lines ECL-U1 of the first stack structure ST1.

Referring to FIG. 18, in the integrated circuit device 9 b, the numberof upper erase control lines ECL-U2 of the second stack structure ST2,which are disposed in the first horizontal direction, and the number oflower erase control lines ECL-D1 of the first stack structure ST1 may beequal to the number of string selection lines SSL and may be greaterthan the number of lower erase control lines ECL-D2 of the second stackstructure ST2 and the number of upper erase control lines ECL-U1 of thefirst stack structure ST1. For example, the number of upper erasecontrol lines ECL-U2 of the second stack structure ST2 and the number oflower erase control lines ECL-D1 of the first stack structure ST1 may betwice the number of lower erase control lines ECL-D2 of the second stackstructure ST2 and the number of upper erase control lines ECL-U1 of thefirst stack structure ST1.

In some embodiments, the number of lower erase control lines ECL-D1 ofthe first stack structure ST1, which are disposed in the firsthorizontal direction, may be equal to the number of ground selectionlines GSL. In some embodiments, the number of upper erase control linesECL-U2 of the second stack structure ST2, which are disposed in thefirst horizontal direction, may be equal to the number of upper erasecontrol lines ECL-U1 of the first stack structure ST1.

FIG. 19 is a cross-sectional view of an integrated circuit device 10according to embodiments of the inventive concept. Here, undescribedportions of the integrated circuit device 10 may be similar inconfiguration and operation to one or more of the integrated circuitdevices previously described in relation to FIGS. 1 through 18,inclusive.

Referring to FIG. 19, the integrated circuit device 10 comprises aperipheral circuit region 514 formed at a first level on a substrate502, and a memory cell array region 512 formed at a second level higherthan the first level on the substrate 502. Here, the term “level”denotes a relative height above the substrate 502 in the verticaldirection, wherein in the illustrated example, the first level is closerto the substrate 502 than the second level.

In some embodiments, the substrate 502 may have a main surface 502Mextending in the first and second horizontal directions. In certainembodiments, the substrate 502 may be similar to the substrate 110described with reference to FIGS. 2A, 2B and 2C.

A peripheral circuit active region AC may be defined by an isolationlayer 504 on the substrate 502. A plurality of transistors TR may beconfigured in the peripheral circuit region 514 of the peripheralcircuit active region AC of the substrate 502. Each of the plurality oftransistors TR may include a gate G, a gate dielectric layer GD, and asource/drain region SD. Both side walls of the gate G may be coveredwith an insulating spacer 106. An etch stop layer 108 may be formed onthe gate G and the insulating spacer 106. The etch stop layer 108 mayinclude an insulating material such as a silicon nitride or a siliconoxynitride.

A plurality of interlayer insulating layers 114A, 114B, 114C, and 114Dmay be sequentially stacked on the etch stop layer 108. The plurality ofinterlayer insulating layers 114A, 114B, 114C, and 114D may include asilicon oxide and a silicon oxynitride. The peripheral circuit region514 includes a multilayer wiring line structure 630 connected to theplurality of transistors TR. The multilayer wiring line structure 630may be insulated by the plurality of interlayer insulating layers 114A,114B, 114C, and 114D.

The multilayer wiring line structure 630 may include a first contact116A, a first wiring line layer 118A, a second contact 116B, a secondwiring line layer 118B, a third contact 116C, and a third wiring linelayer 118C that are sequentially stacked on the substrate 502 and areconnected to one another.

A semiconductor layer 520 that covers the plurality of interlayerinsulating layers 114A, 114B, 114C, and 114D is formed on the peripheralcircuit region 514. The memory cell array region 512 is formed on thesemiconductor layer 520. The memory cell array region 512 has the sameconfiguration as that of the memory cell array region MCA of each of theintegrated circuit devices 1, 1 a, 2, 2 a, 2 b, 2 c, 2 d, 3, 4, 4 a, 5,6, 7, 8, 9, 9 a, and 9 b, previously described with reference to FIGS. 1through 19.

In the integrated circuit device 10, the memory cell array region 512and the peripheral circuit region 514 may be connected through at leastone connection plug 195 vertically extending upward through a fillinsulating layer 172. For example, the common connection wiring line190X of the memory cell array region 512 may be connected to theperipheral circuit region 514 through the at least one connection plug195. The at least one connection plug 195 may be connected to themultilayer wiring line structure 630. For example, the at least oneconnection plug 195 may be connected to a third wiring line layer 118C.

The integrated circuit device 10 has a multilayer device structure inwhich a first level semiconductor device and a second levelsemiconductor device having different functions are stacked tovertically overlap at different levels. Therefore, it is possible toprevent densities of wiring line patterns that configure the multilayerwiring line structure 630 from excessively increasing in the memory cellarray region 512 and to simplify processes of manufacturing theintegrated circuit device. In addition, by reducing the number ofstacked metal wiring line layers having the multilayer wiring linestructure, it is possible to reduce physical stress caused by metalwiring lines and to prevent the substrate from being curved.

While the inventive concept has been particularly shown and describedwith reference to embodiments thereof, it will be understood thatvarious changes in form and details may be made therein withoutdeparting from the spirit and scope of the following claims.

1. An integrated circuit device comprising: a plurality of channelstructures extending in a vertical direction from a main surface of asubstrate; a plurality of memory cell strings disposed in the verticaldirection along the plurality of channel structures, wherein each memorycell string includes a plurality of serially-connected memory cells; aplurality of gate lines spaced apart from one another in the verticaldirection and including erase control lines and string selection lines;and a plurality of driving transistors including erase control drivingtransistors connected to the erase control lines and string selectiondriving transistors connected to the string selection lines, wherein atleast two gate lines spaced apart from one another in a horizontaldirection with respect to the main surface of the substrate among theplurality of gate lines are commonly connected to one of the pluralityof driving transistors. 2-3. (canceled)
 4. The integrated circuit deviceof claim 1, wherein at least two erase control lines are spaced apartfrom one another in the horizontal direction and are commonly connectedby a common connection wiring line extending in the horizontaldirection.
 5. The integrated circuit device of claim 4, furthercomprising: a plurality of bit lines respectively connected to theplurality of memory cell strings, extending in the horizontal direction,and disposed at a level different from that of the common connectionwiring line.
 6. The integrated circuit device of claim 4, furthercomprising: at least two blocks including a first block and a secondblock, wherein the common connection wiring line commonly connects erasecontrol lines of the first block to erase control lines of the secondblock.
 7. (canceled)
 8. The integrated circuit device of claim 1,wherein a thickness of at least one of the erase control lines isgreater than a thickness of at least one of the string selection lines.9. The integrated circuit device of claim 1, further comprising: aplurality of word lines respectively connected to the plurality ofmemory cell strings, wherein a width of each one of the plurality ofword lines in the horizontal direction is at least twice a width of eachone of the plurality of gate lines.
 10. The integrated circuit device ofclaim 9, wherein each one of the plurality of channel structuresincludes a gate insulating layer contacting at least one of theplurality of gate lines and at least one of the plurality of word lines,and a thickness of a first portion of the gate insulating layer facing aside surface of the erase control line is less than a thickness of asecond portion of the gate insulating layer facing side surfaces of theplurality of word lines.
 11. The integrated circuit device of claim 9,wherein each one of the plurality of channel structures includes a gateinsulating layer contacting at least one of the plurality of gate linesand at least one of the plurality of word lines, and a thickness of afirst portion of the gate insulating layer contacting a side surface ofthe erase control line is less than a thickness of a second portion ofthe gate insulating layer contacting a side surface of the stringselection line.
 12. The integrated circuit device of claim 9, whereineach one of the plurality of channel structures includes a gateinsulating layer contacting at least one of the plurality of gate linesand at least one of the plurality of word lines, and a thickness of afirst portion of the gate insulating layer contacting a side surface ofthe string selection line is less than a thickness of a second portionof the gate insulating layer contacting a side surface of at least oneof the plurality of word lines.
 13. The integrated circuit device ofclaim 9, wherein each one of the plurality of channel structuresincludes a gate insulating layer contacting at least one of theplurality of gate lines and at least one of the plurality of word lines,and a channel layer disposed on the gate insulating layer, and anuppermost end of the channel layer is disposed at a level less than orequal to a level at which an uppermost end of the gate insulating layeris disposed. 14-17. (canceled)
 18. The integrated circuit device ofclaim 1, wherein at least two erase control lines spaced apart from oneanother in the horizontal direction are commonly connected to one erasecontrol driving transistor, and each of the at least two stringselection lines spaced apart from one another in the horizontaldirection is connected to one of the at least two string selectiondriving transistors.
 19. The integrated circuit device of claim 1,wherein, in at least one of the erase control lines and one of thestring selection lines are spaced apart from one another in the verticaldirection.
 20. (canceled)
 21. An integrated circuit device comprising:channel structures extending in a vertical direction from a substrate;bit lines respectively connected to the channel structures and extendingin a first horizontal direction; gate electrodes vertically stacked onthe substrate, intersecting the channel structures, having a steppedpattern, and extending in a second horizontal direction over thesubstrate; and an erase control driving transistor and at least twostring selection driving transistors, wherein at least two of the gateelectrodes respectively function as erase control lines, at leastanother two of the gate electrodes respectively function as stringselection lines, the erase control lines and the string selection linesare spaced apart from one another in the first horizontal direction, theerase control lines are commonly connected to the erase control drivingtransistor, and each of the string selection lines is respectivelyconnected to one of the at least two string selection drivingtransistors.
 22. The integrated circuit device of claim 21, furthercomprising: a common connection wiring line extending from one end ofeach of the at least two erase control lines in the first horizontaldirection, wherein the at least two erase control lines are commonlyconnected by the common connection wiring line.
 23. The integratedcircuit device of claim 22, wherein the bit lines extend in the firsthorizontal direction at a level different from that of the commonconnection wiring line.
 24. (canceled)
 25. The integrated circuit deviceof claim 21, wherein the gate electrode other than the at least two ofthe gate electrodes functioning as erase control lines and the at leastanother two of the gate electrodes functioning as string selection linesfunction as word lines, and a width of each one of the at least twoerase control lines and the at least two string selection lines is lessthan one half of a width of each one of the word lines in the firsthorizontal direction.
 26. (canceled)
 27. An integrated circuit devicecomprising: channel structures extending in a vertical direction from asubstrate; memory cell strings disposed in the vertical direction alongthe channel structures, wherein each one of the memory cell stringsincludes serially-connected memory cells; gate electrodes spaced apartfrom one another in the vertical direction, intersecting the channelstructures, and extending in a second horizontal direction over thesubstrate; and driving transistors including erase control drivingtransistors and string selection driving transistors, wherein the gateelectrodes include word lines, erase control lines, and string selectionlines, the at least two of the erase control lines are spaced apart fromone another in a first horizontal direction and are commonly connectedto one erase control driving transistor, and the at least two stringselection lines are spaced apart from one another in the firsthorizontal direction and are respectively connected to the at least twostring selection driving transistors.
 28. The integrated circuit deviceof claim 27, wherein a width of each one of the word lines is at leasttwice that of a width of each one of the erase control lines and thestring selection lines in the first horizontal direction.
 29. Theintegrated circuit device of claim 27, wherein a common connectionwiring line commonly connects the at least two erase control lines to atleast two of the bit lines.
 30. The integrated circuit device of claim29, wherein the common connection wiring line extends from a stepped oneend of the erase control line in the first horizontal direction. 31-35.(canceled)